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ITFPC 07 - Innovations on Thin Films Processing and Characterisation
ITFPC 07 - Innovations on Thin Films Processing and Characterisation


Horaires
20 au Novembre 2007

Lieu
Université Henri Poincaré - Nancy I - Faculté des Sciences et Techniques
Amphi 8 - Boulevard des Aiguillettes - 54500 Vandoeuvre-lès-Nancy
Tel. +33 (0)3 83 68 49 25, Fax +33 (0)3 83 68 49 33

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The third international conference on Innovations on Thin Films Processing and Characterisation ITFPC 07 is, due to it success story, the continuation of the French speaking IEACM conference (Innovations dans l’Elaboration et les Applications des Couches Minces).

The conference is organised by the French Vacuum Society (Société Française du Vide) and many research teams from the institute Jean Lamour of Nancy University. A lot of researchers from many countries are participating to the scientific and organisation committees.

A great progress in thin films processing have been made in research, development and functionnalisation of surfaces making this area one of the most potential field of applications in microelectronics, nanotechnology , mechanics, optics, photonics , chemistry, biology, medicine…..

The aim of ITFPC 07 conference is to provide an open forum to discuss on progress of thin films processing and engineering like the growth and etching, including CVD and PVD processes. The participants should contribute to the diffusion of the state of the art and a perspective of scientific and technological achievement in thin films elaboration, characterisation, functional surface treatment and applications.

In addition, the exhibition held during the conference will cover a large field of equipments and new developments in thin films processing including vacuum equipments, and elaboration and characterisation sytems.

TOPICS:

1. THIN FILMS PROCESSING AND SURFACE ENGINEERING
- Growth and etching of thin films
- Laser, Ion and electron beams processing
- Electrodeposition
- Epitaxy
- Plasmas processes
- PVD, CVD and hybrid techniques
- Thermochemical treatment
- Sol-gel

2. SIMULATION AND THIN FILMS CHARACTERISATION
- Characterisation techniques
- Mechanical and tribological properties
- Nano-scale characterisation
- Large instruments facilities
- Surface engineering simulation

3. PROTECTIVE APPLICATIONS OF THIN FILMS
- Barrier coatings
- Hard, super hard and tough coatings
- Diffusion layers
- Fatigue, wear
- Corrosion and oxidation resistance

4. ENERGY AND ENVIRONMENT APPLICATIONS OF THIN FILMS
- Catalysis
- Energy and environment
- Ionic conductors
- Solar and fuel cells

5. MICRO AND NANOSYSTEMS
- Devices: actuators, sensors…
- Bottom up: self organisation, supramolecular chemistry
- Top down: etching, lithography, nanoprint
- Specific properties of nanostructures

6. NEW MATERIALS AND HEALTH APPLICATIONS OF THIN FILMS
- New materials with specific properties for electronics, optics, thermoelectrics, biological and biomedical applications
- Heterostructures, composites, hybrid systems
- Thin films of complex structures
- New structures obtained thanks to thin film synthesis technologies
- Safety and health



CIP 2007 International Colloquium on Plasma processes
CIP2007


Horaires
28. Nov. - 1. Déc. 2006

Lieu
Centre de Congrès Pierre Baudis, 11 esplanade Compans-Caffarelli, 31685 Toulouse Cedex


The 16th International Colloquium on Plasma processes (CIP’07) will be held at Toulouse, France on June 4-8, 2007. It is organised by the French Vacuum Society (SFV).

- Advanced plasma sources (pulsed plasmas,micro discharges,plasma thrusters...

- Plasma processing : diagnostics and modelling

- Plasma etching and deposition

- Plasma for micro-nano-technology (MEMS,MOEMS,biosensors)

- Plasma for sterilization and decontamination

- Plasma for surface engineering (biocompatibility,biofunctionnalisation,(no)adhesion,wettability...)

- Plasma for protective, tribological and functional coatings (optical,barrier coatings,films for solar and fuel cells...)

www.vide.org



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