Sputtering Target

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cerpotech Ceramic Powder Technology AS - www.cerpotech.com
- Kvenildmyra 6, 7093 Tiller, Norway

email: sales@cerpotech.com, Tel.

Ceramic Powder Technology AS was established 2007 as a joint venture between professors at the Department of Materials Science and Engineering, Norwegian University of Science and Technology (NTNU) and NTNU Technology Transfer AS to bring high quality complex oxide powders to the market.
products:   PLD- or sputtering targets

A typical application for advanced oxide materials is thin films. In deposition techniques such as PLD (Pulsed Laser Deposition) or magnetron sputtering, a sintered disc is used as the source of material. We offer PLD- or sputtering targets made of almost any material from our product portfolio, in addition to customised compositions. With our in house equipment we currently produce targets with the dimensions 1 inch (25 mm) diameter and 2 10 mm thickness. Together with our partners we offer the capability to deliver larger discs and also other geometries, e.g. rectangular substrates.

Our most popular target materials are:
Material - Formula - Short name
Barium ferrite (BaFeO3), BFO
Barium stannate (BaSnO3), BSnO
Barium zirconate, BZO (BaZrO3), BZO
Indium tin oxide (In2O3:SnO2), ITO
Lanthanum aluminate (LaAlO3), LA
Lanthanum nickelate, LNO (La2NiO4+d), LNO
Strontium ruthenium titanate (SrTi0.95Ru0.05O3), STR
Strontium titanate (SrTiO3), STO
Yttrium titanate (Y2Ti2O7), YTO




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